Author

W. Wu, W. M. Tong, J. Bartman, Y. Chen, R. Walmsley, Z. Yu, D. Stewart, I. Park, C. Picciotto, J. Gao, S-Y. Wang, and R. S. Williams

Conference

Proceedings of SPIE Advanced Lithography

Location

San Jose, California

Period

Feb 2008 (invited)